WebArticle “Model-based OPC using the MEEF matrix II” Detailed information of the J-GLOBAL is a service based on the concept of Linking, Expanding, and Sparking, linking … Web30 okt. 2024 · Use of the gradient of image slope with respect to change in edge position was introduced by Granik as the “contrast matrix.” Whereas traditional OPC techniques …
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WebIn this paper we describe the level set method to represent mask patterns, which allows the necessary degrees of freedom for required lithographic performance, and show how to derive Manhattan mask... Web28 mei 2004 · In this paper, we will discuss two new concepts to be used in model-based OPC: model-based fragmentation, and model tagging to account for long-range proximity effects. In model-based fragmentation we create an initial fragmentation consisting of small fragmentation across the design. rock raised eyebrow
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Web28 feb. 2014 · Several algorithms have been proposed to minimize edge placement error (around wafer image contours) in model-based OPC. Mask error enhancement factor … Web1.A method to improve a lithographic process for imaging a portion of a patterning device pattern onto a substrate using a lithographic apparatus comprising an illumination system and projection optics, the method comprising: obtaining a simulation model that models projection of radiation by the projection optics, wherein the simulation model models an … WebCobb, N., and Y. Granik, “Model-Based OPC Using the (60) Royal applits N.E. SS ag. MEEF Matrix,” Proceedings of SPIE, vol. 4889: 22nd file d s FE application No. 60/360,692, Annual BACUS Symposium On Photomask Technology, ed on Feb. 28, 2002. Monterey, Calif., Sep. 30–Oct. 4, 2002, p. 147. (51) Int. Cl. rock raising an eyebrow